Sputtering Target

Our range of products include titanium copper palladium zirconium sputtering targets, copper sulfide sputtering target, sputtering target (nickel ), silicon carbide micropowder, sputtering target (chromium ) and tungsten oxide nanorodes.

Titanium Copper Palladium Zirconium Sputtering Targets

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Product Details:

Minimum Order Quantity	1 Piece
Purity	99.9%
Shape	Round
Material	Titanium Copper Palladium Zirconium Sputtering Targets
Brand	Nanoshel
Packaging	As per customer requirement
Diameter	50 mm
Model Name/Number	NS6130-10-1023
CAS	1344-28-1
Molecular Formula	TiCuPdZr
Thickness	3 mm
Backing Plate	Copper (as per customer requirement)

Backed by our rich industrial expertise, we have come up with Alloy Sputtering Targets for our valuable customers. Formulated under hygienic conditions and thoroughly tested, this is highly regarded in the market. It finds application as catalysts, energy conserving coatings, anti-static coatings, etc. It is a white colored powder of optimum purity. We offer tin oxide nanopowder at standard market prices.

Composition	Ti/Cu/Pd/Zr
Dia	60mm
Thickness	0.5mm
Purity	>99.9%

Sputtering Target Chemical Composition

Titanium(Ti)	40%
Copper(Cu)	36%
palladium(Pd)	14%
Zirconium(Zr)	10%

Features:

Formulated under hygienic conditions
Quality tested
High purity

Product Description:

Stock No:130-10-1023	Titanium Copper Palladium Zirconium (Ti/Cu/Pd/Zr, Purity: 99.9%)
Stock No:130-10-1028	Titanium Copper Palladium Zirconium (Ti/Cu/Pd/Zr, Purity: 99.9%)
Stock No: 130-10-1030	Titanium Copper Palladium Zirconium (Ti, Purity: 99.9%)
Stock No: 130-10-1052	Titanium Copper Palladium Zirconium (Ti/Cu/Pd/Zr, Purity: 99.9%)
Stock No: 130-10-1060	Titanium Oxide(TiO2,Purity: 99.9%)

Additional Information:

Item Code: NS6130-10-1023
Pay Mode Terms: L/C (Letter of Credit),T/T (Bank Transfer)
Port of Dispatch: Delhi
Production Capacity: 100 pcs
Delivery Time: 4Weeks
Packaging Details: As per customer requirements

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Copper Sulfide Sputtering Target

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Product Details:

Minimum Order Quantity	1 Piece
Purity	99.99%
Shape	Round
Material	Copper Sulfide Sputtering Target
Melting Point	500 Degree C
Packaging	As per customer requirement
Density	4.6g/cm3
Diameter	50mm
Model Name/Number	NS6130-10-1066
Thickness	3mm
Molecular Formula	CuS
Molecular Weight	95.61g/mol
CAS Number	1317-40-4
Brand	Nanoshel

Clients can avail the offered range of Copper Sulfide Sputtering Target from us. This product is formulated with the help of premium quality chemical compound and sophisticated technology in compliance to set company norms. The offered product is sternly monitored on various parameters to ensure its quality. Clients can avail this cleaner from us in various packaging options as per their requirements.Stock no - NS6130-10-1066

Additional Information:

Item Code: NS6130-10-1066
Production Capacity: 100 Piece
Delivery Time: 4 weeks
Packaging Details: As per customer requirements

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Sputtering Target (Nickel )

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Product Details:

Minimum Order Quantity	100 Piece
Material	Nickel Sputtering Target
Melting Point	1455 Degree C
Packaging	As per customer requirement
Density	58.69g/cm3
Diameter	50 mm + 1mm
Model Name/Number	NS6130-10-1047
Purity	99.9%
Boiling Point	2732 Degree C
Molecular Formula	Ni
Molecular Weight	58.69g/mol
Color	Gray

Clients can avail the offered range of Sputtering Target from us. This product is formulated with the help of premium quality chemical compound and sophisticated technology in compliance to set company norms. The offered product is sternly monitored on various parameters to ensure its quality. Clients can avail this cleaner from us in various packaging options as per their requirements.

Product Name	Sputtering Target (Nickel )
Composition	Si3N4
Diameter	100mm
Thickness	4mm
Purity	>99.9%

Features:

Effective
Accurate chemical composition
Quick result

Stock No. NS6130-10-1047

Sputtering Target (Nickel)

Additional Information:

Item Code: NS6130-1047
Pay Mode Terms: L/C (Letter of Credit),T/T (Bank Transfer)
Port of Dispatch: Delhi
Production Capacity: 100kg
Delivery Time: 4Weeks
Packaging Details: As per customer requirements

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Silicon Carbide Micropowder

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Product Details:

Brand	Nanoshel
Purity	99.9%
Packaging Type	As per customer requirement
Packaging Size	As per customer requirement
CAS Number	7440-21-3
Molecular Weight	28.08g/mol
Density	2.33g/cm3
Melting Point	1414 Degree C
Boiling Point	2900 Degree C
Solubility	Insoluble in Water
APS	40-50um
Molecular Formula	Si

Backed by our rich industrial expertise, we have come up with Silicon Carbide Micropowder for our valuable customers. Formulated under hygienic conditions and thoroughly tested, this is highly regarded in the market. It finds application as catalysts, energy conserving coatings, anti-static coatings, etc. It is a white colored powder of optimum purity. We offer Nanopowder at standard market prices.

Product	Silicon Carbide Micro powder
Purity	>99.9% (Metal Analysis)
APS	60-70 microns
(SSA)	2 – 5 m2/g
Colour	Grayish White
Morphology	Nearly Spherical
True Density	3.99 g/cm3

Features:

Formulated under hygienic conditions
Quality tested
High purity

Product Description:

Stock No: 6130-05-558

Silicon Carbide Micropowder (Purity:>99 %, APS:<70um)

Additional Information:

Item Code: NS6130-5-558
Pay Mode Terms: L/C (Letter of Credit),T/T (Bank Transfer)
Port of Dispatch: Delhi
Production Capacity: 100Kg
Delivery Time: 4Weeks
Packaging Details: As per customer requirements

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Sputtering Target (Chromium )

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Product Details:

Minimum Order Quantity	100 Piece
Shape	Round
Material	Chromium Sputtering Target
Melting Point	1857 Degree C
Packaging	As per customer requirement
Density	7.19 g/cm3
Diameter	50 mm +- 1mm
Model Name/Number	NS6130-10-1053
Purity	99.9%
Boiling Point	2672 Degree C
Thickness	3 mm + 0.5mm
Molecular Formula	Cr
Molecular Weight	51.996 g/mol
Electronegativity	1.6 Paulings
CAS	7440-47-3

Product Name	Chromium Sputtering (50mm)
Composition	Cr
Diameter	50mm
Thickness	2mm
Purity	>99.9%

Features:

Effective
Accurate chemical composition
Quick result

Stock No. NS6130-10-1053

Chromium Sputtering Target(50MM)

Additional Information:

Item Code: NS6130-10-1053
Pay Mode Terms: L/C (Letter of Credit),T/T (Bank Transfer)
Port of Dispatch: Delhi
Production Capacity: 100kg
Delivery Time: 4Weeks
Packaging Details: As per customer requirements

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Tungsten Oxide Nanorodes

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Product Details:

Minimum Order Quantity	100 Gram
Brand	Nanoshel
Purity	99.9%
Physical State	Liquid
Packaging Type	As per customer requirements
Packaging Size	As per customer requirements
CAS Number	1314-35-8
Molecular Weight	230.25g/mol
pH Value	7.9-8.1
Density	7.16g/cm3
Appearance	Gray Black
Diameter	40-60nm
Length	up to 200um
Concentration	1 - 2 %
Coefficient of Variation	51%
Standard Deviation	10%
Solvent	Ethanol, Water, Isopropyl Alcohol
Polymer Content	0.5%
Stock no	NS6130-04-000246

This material ships as dry granules or powder. Each grade contains particles with an average thickness and surface area. All dimensions represent median sizes and there is a distribution around the mean. Tungsten Oxide Nanorods by Nanoshel.

Product Name	Tungsten Oxide Nanorods
Stock No	NS6130-12-000246
CAS	1314-35-8
Diameter	40-60nm
Purity	99+%
Color	Gray black
Length	1-2microns

Features:

Purity
Eco-friendliness
Accurate composition

Specification:

Stock No.	Product Description
NS6130-12-000246	Tungsten Oxide Nanorods

Additional Information:

Item Code: NS6130-04-000246
Pay Mode Terms: L/C (Letter of Credit),T/T (Bank Transfer)
Port of Dispatch: Delhi
Production Capacity: 100Kg
Delivery Time: 4Weeks
Packaging Details: As per customer requirements

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Zirconium Copper Aluminium Silver( Sputtering Targets)

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Product Details:

Minimum Order Quantity	100 Piece
Purity	99.9%
Shape	Round
Material	Zr/Cu/Al/Ag Sputtering Target
Packaging	As per customer requirement
Diameter	50 mm + 1mm
Model Name/Number	NS6130-10-1022
Product	Sputtering Target
Thickness	3 mm + 0.5mm
Molecular formula	ZrCuAlAg
Backing Plate	Copper (as per customer requirement)

Sputtering Targets is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is repeatable and can be scaled up from small research and development projects, to production batches involving medium to large substrate areas. The sputtering gas is often an inert gas such as argon. For efficient momentum transfer projectile mass must match target mass, so for sputtering light elements neon is also used and for heavy elements krypton or xenon. Reactive gases are used to sputter compounds. The chemical reaction can occur on the target surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process but allow experts a large degree of control over the growth and microstructure of the film Zirconium Copper Aluminium silver By Nanoshel.

Composition	Zr/Cu/Al/Ag
Dia	60mm
Thickness	0.5mm
Purity	>99.9%

Sputtering Target Chemical Composition

Zirconium(Zr)	48%
Copper(Cu)	36%
Aluminium(Al)	8%
Silver(Ag)	8%

Features:

Formulated under hygienic conditions
Quality tested
High purity

Product Description:

Stock No:130-10-1022	Zirconium Copper Aluminium Silver (Zr/Cu/Al/, Purity: 99.9%)
Stock No:130-10-1027	Zirconium Copper Aluminium Silver (Zr/Cu/Al/, Purity: 99.9%)
Stock No: 130-10-1029	Zirconium Copper Aluminium Silver (Zr/Cu/Al/, Purity: 99.9%)
Stock No: 130-10-1046	Zirconium (Zr, Purity: 99.9%)

Additional Information:

Item Code: NS6130-10-1022
Pay Mode Terms: L/C (Letter of Credit),T/T (Bank Transfer)
Port of Dispatch: Delhi
Production Capacity: 100Kg
Delivery Time: 4Weeks
Packaging Details: As per customer requirements

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